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Produktinformasjon
Produktoversikt
The SFH4715AS from Osram is an OSLON black series high efficiency (850nm), 90°, high power infrared emitter. This has low thermal resistance (maximum 9K/W) and superior corrosion robustness. The product qualification test plan is based on the guidelines of AEC-Q101-REV-C, stress test qualification for automotive grade discrete semiconductors. It has 11/14ns rise and fall time of Ie (10% and 90% of Ie max) (IF = 3A, RL = 50 ohm), 3.2V (≤ 3.6V) forward voltage (IF = 1A, tp = 10ms), 3.35V (≤ 3.85V) forward voltage (IF = 1.5A, tp = 100µs), 3.8V (≤ 4.7V) forward voltage (IF = 3A, tp = 100µs). The temperature coefficient of Ie or Φe (IF = 1A, tp = 10ms) is -0.3%/K, temperature coefficient of VF (IF = 1A, tp = 10ms) is -2mV/K, temperature coefficient of wavelength (IF = 1A, tp = 10ms) is 0.3nm/K. It is suitable for use in CCTV surveillance, eye tracking, gesture recognition, safety systems and CCTV.
- 780 (≥ 500)mW/sr radiant intensity at IF= 1A, tp= 10ms, IR light source with high efficiency
- 1V reverse voltage, 1500mA forward current, 3A surge current (tp = 2ms, D = 0)
- Power consumption (Ptot) is 5.8W, double stack emitter
- ESD withstand voltage is 2KV according to ANSI/ ESDA/ JEDEC JS-001 - HBM
- 860nm peak wavelength (IF = 1A, tp = 10ms), 850nm centroid wavelength (IF = 1A, tp = 10ms)
- Total radiant flux is 2000mW (IF = 1.5A, tp= 100µs)/1340mW (IF=1A, tp= 10ms)
- 30nm spectral bandwidth at 50% of Imax (IF = 1A, tp = 10ms)
- ±45° half angle, dimensions of active chip area is 1mm x 1mm (L x W)
- Operating temperature range from -40°C to 125°C
Advarsler
Depending on the mode of operation, this device emits highly concentrated non visible infrared light which can be hazardous to the human eye.
Merknader
Products which incorporate this device has to follow the safety precautions given in IEC 60825-1 and IEC 62471.
Tekniske spesifikasjoner
860nm
SMD
11ns
1.5A
-40°C
AEC-Q101
No SVHC (21-Jan-2025)
90°
780mW/Sr
14ns
3.85V
125°C
OSLON Black Series
Teknisk dokumentasjon (2)
Lovgivning og miljø
Land der forrige produksjonsprosess av betydning ble fortattOpprinnelsesland:Malaysia
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